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等离子体化学气相沉积

网络PCVD; PECVD; Plasma Enhanced Chemical Vapor Deposition

等离子体化学气相沉积

等离子体化学气相沉积

等离子体化学气相沉积

PCVD

“等离子体化学气相沉积(PCVD)硬膜技术工艺与装置的研究”曾列为国家自然科学基金重大项目、国家八五重点科技攻关项目、 …

PECVD

用等离子体化学气相沉积（PECVD）法，通过改变[SiH4∶N2] [NH3] 的流量比沉积SiN 薄膜．用椭圆偏.. 全部>> wang5945 热 …

Plasma Enhanced Chemical Vapor Deposition

...寸晶圆的半导体薄膜（氧化硅、氮化硅、碳化硅等材料）等离子体化学气相沉积（Plasma Enhanced Chemical Vapor Deposit…

plasma chemical vapor deposition

阴极等离子体液相沉积,cathodic... ... ) plasma chemical vapor deposition 等离子体化学气相沉积 ) PCVD 等离子体化学气相沉 …

Plasma Chemistry Vapor Deposition

1. PCVD: 等离子体化学气相沉积(Plasma Chemistry Vapor Deposition) | 猪圆环病毒病 | 物理化学气相沉积 | Plasma Chemical …

Pcvd plasma chemistry vapor deposition

2

Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film .

等离子体化学气相沉积技术制备氢化硅薄膜工艺条件成熟稳定而成为薄膜制备的首选方法。

3

Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.

为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。

6

Influence of pressure on nucleation of diamond by microwave plasma enhanced chemical vapor deposition synthesis

系统压强对微波等离子体化学气相沉积金刚石成核的影响

10

Fabrication of diamond tubes in the microwave plasma CVD system and their characterization

微波等离子体化学气相沉积法制备金刚石管及其表征

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