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化学机械抛光

网络CMP; chemical mechanical polishing, CMP; Chemical Mechanical Polishing

化学机械抛光

网络释义

化学机械抛光

CMP

化学机械抛光[综合电子]_老古开发网文章化学机械抛光（CMP）是一种还不足20年历史的技术,它由IBM公司于1980年代中期开 …

chemical mechanical polishing, CMP

化学机械抛光(chemical mechanical polishing,CMP)是一项融合了化学分解和机械力学的工艺技术,其中包含了流体动力润滑的 …

Chemical Mechanical Polishing

【摘要】： 化学机械抛光(Chemical Mechanical Polishing)是芯片制造过程中频繁使用的最重要的工序之一,对于提高芯片的成 …

Chemical Mechanical Polish, CMP

未来在降低成本的要求上，结合基板抛光与碟片刻纹为一的化学机械抛光(Chemical Mechanical Polish, CMP)制程，成为重要 …

Chem-Mech polishing

半导体缺陷解析及中英文术语... ... 择优腐蚀 preferential etching 化学机械抛光 Chem-Mech polishing 抛光面 polished surface ...

chemmically mechanically polish

CMP是什么意思... ... 5. abbr. chemmically mechanically polish; 化学机械抛光 6. abbr. common-mid point; 共中心点 ...

例句：

The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.

本发明进一步提供一种利用上述抛光组合物对基板进行化学机械抛光的方法。

Diamond disk conditioners have long served the semiconductor chemical mechanical polishing (CMP) process for polish pad dressing .

钻石修整器应用于化学机械抛光中抛光垫的修整，已有很长的一段时间。

A chemical mechanical polishing pad comprising a water-insoluble matrix which comprises (A ) a styrene polymer and (B) a diene polymer.

一种化学机械抛光垫，包含由（A ）苯乙烯聚合物和（B ）二烯聚合物构成的非水溶性基质。

The work of this task must accelerate the sizable application of CMP and promote the development of the 1C industry .

本课题所作的工作必将促进化学机械抛光工艺早日实现规模化应用，推动集成电路工业的发展。

This dissertation tries to investigate some kinds of problems of IC manufacturability and yield by studying CMP process and test chip .

本文从化学机械抛光和测试芯片两个方面对可制造性和成品率问题展开了分析和研究。

Applied Study of Electrochemistry Theory on the Copper Chemical-mechanical Polishing

铜化学机械抛光中电化学理论的应用研究

Simulation for an Abrasive Particle of the Chemical Mechanical Polishing with AFM

基于 AFM 的化学机械抛光磨粒模拟研究

Study on Fixed-abrasive Chemical-mechanical Polishing Technology of Wafer in Integrate Circuit Manufacturing

集成电路制造中的固结磨料化学机械抛光技术研究

Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing

ULSI 制造中铜化学机械抛光的腐蚀磨损机理分析

Electrochemical -Mechanical Polishing Technique and Equipment for Tools

模具电化学 -机械抛光技术及装备

Application of Chemical Mechanical Polishing Technology on the Finish Machining

化学机械抛光技术在超精加工中的应用

Research of Chemical Mechanical Polishing Technique of Sapphire Substrate

蓝宝石衬底的化学机械抛光技术的研究

Research and Prospects on Copper Chemical Mechanical Polishing in ULSI Manufacturing

ULSI 制备中铜布线化学机械抛光技术的研究与展望

Polishing Equipment of Electricity-Chemistry-Machinery and Working

电化学机械抛光设备与操作

Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing

介质的化学机械抛光

Characterization of Chemical Mechanical Planarization With White Light in Interferometry

用白光干涉测量法描述化学机械抛光面

Galvanic Corrosion of TiN-W Electro-couple During Tungsten Chemical Mechanical Polishing

钨的化学机械抛光过程中 TiN-W 电偶的腐蚀行为

Recent Advancement of Chemical -Mechanical Polishing Technology of Metal

金属的化学 -机械抛光技术研究进展

Material Removal Mechanism and Model in Chemical Mechanical Polishing of Silicon Wafers

硅晶片化学机械抛光材料去除机制与模型

Chemical Effect Mechanism in Chemical Mechanical Polishing for Silicon Wafer

硅晶片化学机械抛光中的化学作用机理

Research on Surface Topography of Silicon Wafer in Chemical-mechanical Polishing

硅片化学机械抛光中表面形貌问题的研究

Chemical Mechanical Polishing of Sapphire Substrate

蓝宝石衬底片化学机械抛光的研究

Micro-Polar Effects of Flow Features of Slurries in Chemical Mechanical Polishing Process

化学机械抛光中抛光液流动的微极性分析

化学机械抛光

化学机械抛光

CMP

chemical mechanical polishing, CMP

Chemical Mechanical Polishing

Chemical Mechanical Polish, CMP

Chem-Mech polishing

chemmically mechanically polish

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